High power light source for future extreme ultraviolet lithography based on energy-recovery linac free-electron laser
نویسندگان
چکیده
The development of ways to increase the intensity extreme ultraviolet (EUV) light sources for future EUV lithography is important realize high throughput fine patterning. energy-recovery linac (ERL) free-electron laser (FEL), which an accelerator based source, a candidate this. We clarify design concept ERL-FEL lithography, delivery systems FEL multiscanners, and items technologies possibility beyond EUV.
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ژورنال
عنوان ژورنال: Journal of micro/nanopatterning, materials, and metrology
سال: 2022
ISSN: ['2708-8340']
DOI: https://doi.org/10.1117/1.jmm.21.2.021210